完整后设资料纪录
DC 栏位 | 值 | 语言 |
---|---|---|
dc.contributor.author | 張尹倫 | zh_TW |
dc.contributor.author | 李佩雯 | zh_TW |
dc.contributor.author | Chang,Yin-Lun | en_US |
dc.contributor.author | Li, Pei-Wen | en_US |
dc.date.accessioned | 2018-01-24T07:42:35Z | - |
dc.date.available | 2018-01-24T07:42:35Z | - |
dc.date.issued | 2017 | en_US |
dc.identifier.uri | http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070450177 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/142696 | - |
dc.description.abstract | 本論文將一步驟氧化形成鍺量子點/二氧化矽/矽鍺之異質結構製作於金氧半場效電晶體之通道區。利用SOI基板本身之Buried oxide作為披覆層,氮化矽二維錐形波導作為核心層提供對接耦合(Butt couple)的媒介;閘極金屬選用可透光之氧化銦錫作為電極。以乾蝕刻調控閘氧化層厚度至38.5 nm及3.5 nm,並以鍺量子點及矽鍺作為光吸收材料,製作出可供垂直入射及側向入射量測之光電晶體。 閘氧化層厚度3.5 nm元件在未照光下,常溫所量測之次臨限斜率為80 mV/decade,元件開關電流比值達到3.41×108 A/A,顯示極佳的閘極調控能力。當元件關閉時,以功率約1.9 mW,波長850 nm、1310 nm及1550 nm光垂直入射下,分別得到108、300及30 A/A之光增益;當元件開啟時,以功率約0.1 μW,波長850 nm、1310 nm及1550 nm光垂直入射下,光響應度分別為139.4、2.23及6.81 A/W。顯示元件在近紅外光波段具有優異的光偵測特性。端面研磨後進行閘氧化層厚度38.5 nm元件之側向照光量測,在功率143 μW,波長850 nm側向入射光下,有15.3倍的光增益。波導整合的光偵測元件將使光連結系統的更加容易及可行。 | zh_TW |
dc.description.abstract | In this thesis, we fabricated a heterostructure of Ge Quantum Dots/SiO2/SiGe in the channel of a MOSFET in a single oxidation step. Applying the buried oxide layer of SOI substrate and the 2-D tapered Si3N4 waveguide as the cladding and core layer for butt-coupling, respectively. For normal incidence optimal transmission, we chose ITO as the gate electrode. In other words, we demonstrated a waveguided phototransistor which can be measured either by normal incidence or lateral incidence, the absorption layer consists of Ge QDs and SiGe shell . We controlled the gate oxide thickness of 38.5 nm and 3.5 nm by means of dry etching. In the darkness, good switching behavior (subthreshold swing of 80 mV/decade), and high on/off ratio (Ion/Ioff = 3.41×108 A/A) were measured on the phototransistor with tox=3.5 nm at 300K. At off state, photocurrent gains are 108, 300, and 30 A/A under a normal incidence power of about 1.9 mW at 850 nm, 1310 nm, and 1550 nm, respectively. At on state, photoresponsivities are 139.4, 2.23, 6.81 A/W under a normal incidence power of about 0.1 μW at 850 nm, 1310 nm, and 1550 nm, respectively. Indicating that the phototransistor has a significant photodetection in the near-infrared regime. After the edge polishing, photocurrent gain value of 15.3 A/A under a lateral incidence power of 143 μW at 850 nm are measured on the phototransistor with tox=38.5 nm. The waveguided phototransistor would provide a better access to Si optical interconnect and make the integration more feasible. | en_US |
dc.language.iso | zh_TW | en_US |
dc.subject | 光電晶體 | zh_TW |
dc.subject | 氮化矽波導 | zh_TW |
dc.subject | 鍺量子點 | zh_TW |
dc.subject | Phototransistor | en_US |
dc.subject | waveguide-coupled | en_US |
dc.subject | Gemanium Quantum Dots | en_US |
dc.title | 氮化矽波導整合鍺量子點光電晶體之研製及分析 | zh_TW |
dc.title | Fabrication and Characterization of Waveguided Ge Quantum Dots Phototransistor | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 電子研究所 | zh_TW |
显示于类别: | Thesis |