Browsing by Author Pan, FM

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Issue DateTitleAuthor(s)
21-Mar-2005Field emission of carbon nanotubes on anodic aluminum oxide template with controlled tube densityChen, PL; Chang, JK; Kuo, CT; Pan, FM; 材料科學與工程學系; Department of Materials Science and Engineering
2004Influence of annealing sequence on p(+)/n junction images studied by scanning capacitance microscopyChang, MN; Wan, WW; Chen, CY; Lai, JH; Liang, JH; Pan, FM; 材料科學與工程學系; Department of Materials Science and Engineering
1-Sep-2001An investigation of scanning capacitance microscopy on iron-contaminated p-type siliconChang, MN; Chang, TY; Pan, FM; Wu, BW; Lei, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Jun-2003Microstructure and mechanical properties of surfactant templated nanoporous silica thin films: Effect of methylsilylationChen, JY; Pan, FM; Cho, AT; Chao, KJ; Tsai, TG; Wu, BW; Yang, CM; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
1-Oct-1999The novel improvement of low dielectric constant methylsilsesquioxane by N2O plasma treatmentChang, TC; Liu, PT; Mor, YS; Sze, SM; Yang, YL; Feng, MS; Pan, FM; Dai, BT; Chang, CY; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-Aug-2002Observation of differential capacitance images on slightly iron-contaminated p-type siliconChang, MN; Chen, CY; Pan, FM; Chang, TY; Lei, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
10-May-2004Preparation and phase transformation of highly ordered TiO2 nanodot arrays on sapphire substratesChen, PL; Kuo, CT; Pan, FM; Tsai, TG; 材料科學與工程學系; Department of Materials Science and Engineering
1-Jul-2005The preparation of mesoporous silica ultra-low-k film using ozone ashing treatmentCho, AT; Pan, FM; Chao, KJ; Liu, PH; Chen, JY; 材料科學與工程學系; Department of Materials Science and Engineering
1-Apr-2002Preventing dielectric damage of low-k organic siloxane by passivation treatmentChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Aug-1996Schottky contact and the thermal stability of Ni on n-type GaNGuo, JD; Pan, FM; Feng, MS; Guo, RJ; Chou, PF; Chang, CY; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-Jan-2004Selective growth of carbon nanotube on scanning probe tips by microwave plasma chemical vapor depositionPan, FM; Liu, YB; Chang, Y; Chen, CY; Tsai, TG; Chang, MN; Sheu, JT; 材料科學與工程學系; Department of Materials Science and Engineering
28-Apr-2003Self-organized titanium oxide nanodot arrays by electrochemical anodizationChen, PL; Kuo, CT; Tsai, TG; Wu, BW; Hsu, CC; Pan, FM; 材料科學與工程學系; Department of Materials Science and Engineering
31-Oct-1997Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatmentMei, YJ; Chang, TC; Chang, SJ; Pan, FM; Chen, MSK; Tuan, A; Chou, S; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2004Stable blue luminescence from mesoporous silica filmsShieh, JM; Cho, AT; Lai, YF; Dai, BT; Pan, FM; Chao, KJ; 材料科學與工程學系; 應用化學系; Department of Materials Science and Engineering; Department of Applied Chemistry
1-Apr-2001The strong degradation of 30 angstrom gate oxide integrity contaminated by copperLin, YH; Chen, YC; Chan, KT; Pan, FM; Hsieh, IJ; Chin, A; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1995Study of Schottky barriers on n-type GaN grown by LP-MOCVDGuo, JD; Feng, MS; Pan, FM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1996Thermal stability and interaction between SiOF and Cu filmMei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY; 交大名義發表; 電子工程學系及電子研究所; National Chiao Tung University; Department of Electronics Engineering and Institute of Electronics
1-Sep-2005Thermal stability of trimethylsilylated mesoporous silica thin films as the ultralow-k dielectric for copper interconnectsChen, JY; Pan, FM; Chang, L; Cho, AT; Chao, KJ; 材料科學與工程學系; 應用化學系; Department of Materials Science and Engineering; Department of Applied Chemistry
1-Oct-2002Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processingChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Chu, CJ; Pan, FM; Lur, W; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Mar-2005Tube number density control of carbon nanotubes on anodic aluminum oxide templateChen, PL; Chang, JK; Pan, FM; Kuo, CT; 材料科學與工程學系; Department of Materials Science and Engineering