背通道蝕刻型雙層氧化銦鎢/氧化銦鎢鋅 薄膜電晶體技術之研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	陳玟慈	zh_TW
dc.contributor.author	劉柏村	zh_TW
dc.contributor.author	楊界雄	zh_TW
dc.contributor.author	Chen, Wen-Tzu	en_US
dc.contributor.author	Liu, Po-Tsun	en_US
dc.contributor.author	Yang, Kei-Hsiung	en_US
dc.date.accessioned	2018-01-24T07:41:36Z	-
dc.date.available	2018-01-24T07:41:36Z	-
dc.date.issued	2017	en_US
dc.identifier.uri	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070458018	en_US
dc.identifier.uri	http://hdl.handle.net/11536/141982	-
dc.language.iso	en_US	en_US
dc.subject	背通道蝕刻	zh_TW
dc.subject	氧化銦鎢	zh_TW
dc.subject	氧化銦鎢鋅	zh_TW
dc.subject	薄膜電晶體	zh_TW
dc.subject	雙層主動層	zh_TW
dc.subject	Back-Channel Etched	en_US
dc.subject	In-W-O	en_US
dc.subject	In-W-Zn-O	en_US
dc.subject	Thin Film Transistors	en_US
dc.subject	Double Layer	en_US
dc.title	背通道蝕刻型雙層氧化銦鎢/氧化銦鎢鋅薄膜電晶體技術之研究	zh_TW
dc.title	Study on Back-Channel Etched Double Layer In-W-O/In-W-Zn-O Thin Film Transistors Technology	en_US
dc.type	Thesis	en_US
dc.contributor.department	光電系統研究所	zh_TW
顯示於類別：	畢業論文