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dc.contributor.authorHuang, C. K.en_US
dc.contributor.authorSun, K. W.en_US
dc.contributor.authorChang, W-L.en_US
dc.date.accessioned2019-04-03T06:36:23Z-
dc.date.available2019-04-03T06:36:23Z-
dc.date.issued2012-01-02en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OE.20.000A85en_US
dc.identifier.urihttp://hdl.handle.net/11536/15684-
dc.description.abstractThis experiment demonstrates the process for manufacturing a ZnO honeycomb sub-wavelength structure using nanosphere lithography technology exhibiting excellent anti-reflection properties from the UV to NIR wavelength regions. This honeycomb nanostructure, combined with commercially available crystalline Si solar cells, show substantially improved conversion efficiency from 15.6% to 16.6% using optimized honeycomb sizes and precursor concentrations of ZnO. The present work develops an unsophisticated and economical technique suitable for industrial applications in producing a uniform and low-reflective texture. (C)2011 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleEfficiency enhancement of silicon solar cells using a nano-scale honeycomb broadband anti-reflection structureen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OE.20.000A85en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume20en_US
dc.citation.issue1en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000300082100010en_US
dc.citation.woscount29en_US
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