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dc.contributor.authorHsu, SYen_US
dc.contributor.authorWang, ICen_US
dc.contributor.authorLiao, JTen_US
dc.date.accessioned2014-12-08T15:45:28Z-
dc.date.available2014-12-08T15:45:28Z-
dc.date.issued2000-04-01en_US
dc.identifier.issn0921-4526en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0921-4526(99)00733-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/30615-
dc.description.abstractWe have performed electronic tunneling density of states and resistivity measurements in three-dimensional CuxGe100-x films spanning the weakly and strongly localized regimes. We found that the Coulomb anomaly in tunneling density of states in the strongly disordered regime is very profound and grows in strength with resistivity. However, when the system becomes less disorderly and approaches the weakly disordered regime, this anomaly weakens rapidly. The data suggest that the disorder enhanced electron-electron interaction effects can drive the crossover from weak: disorder to strong disorder in CuGe alloy system. (C) 2000 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectelectron-electron interaction effectsen_US
dc.subjectCoulomb anomalyen_US
dc.subjectweak-to-strong disorder crossoveren_US
dc.titleCoulomb tunneling anomaly in disordered copper-germanium alloysen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/S0921-4526(99)00733-4en_US
dc.identifier.journalPHYSICA Ben_US
dc.citation.volume279en_US
dc.citation.issue1-3en_US
dc.citation.spage196en_US
dc.citation.epage199en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000085314700054-
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