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dc.contributor.authorTseng, Shih-Fengen_US
dc.contributor.authorHsiao, Wen-Tseen_US
dc.contributor.authorChiang, Donyauen_US
dc.contributor.authorHuang, Kuo-Chengen_US
dc.contributor.authorChou, Chang-Pinen_US
dc.date.accessioned2014-12-08T15:11:30Z-
dc.date.available2014-12-08T15:11:30Z-
dc.date.issued2011-06-01en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2011.03.091en_US
dc.identifier.urihttp://hdl.handle.net/11536/8817-
dc.description.abstractThe fluorine-doped tin oxide (FTO) thin film deposited on a soda-lime glass substrate was annealed by a defocus ultraviolet (UV) laser irradiation at ambient temperature. The mechanical and optoelectric properties of FTO films annealed by using the various laser processing parameters were reported. After the FTO films were subjected to laser post-annealing, the microhardness were slightly less but the reduced modulus values were larger than that of unannealed FTO films, respectively. The average optical transmittance in the visible waveband slightly increased with increasing the laser annealing energy and scan speed. Moreover, all the sheet resistance of laser annealed films was less than that of the unannealed ones. We found that the sheet resistance decrease was obviously influenced by annealing. The suitable annealing conditions could maintain the film thickness and relief the internal stress generated in the film preparation process to improve the electrical conductivity via decreasing laser energy or increasing scan speed. Crown Copyright (C) 2011 Published by Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectFluorine-doped tin oxide (FTO)en_US
dc.subjectUV laser irradiationen_US
dc.subjectPost-annealingen_US
dc.subjectMechanical propertyen_US
dc.subjectOptoelectric propertyen_US
dc.titleMechanical and optoelectric properties of post-annealed fluorine-doped tin oxide films by ultraviolet laser irradiationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2011.03.091en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume257en_US
dc.citation.issue16en_US
dc.citation.spage7204en_US
dc.citation.epage7209en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000290015600032-
dc.citation.woscount14-
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