8吋矽晶半導體LPCVD製程設備之研發---總計畫(III)

標題:	8吋矽晶半導體LPCVD製程設備之研發---總計畫(III) Research and Development of LPCVD Process Equipment for Eight Inch Single Silicon Wafer (III)
作者:	林清發 LIN TSING-FA 交通大學機械工程系
關鍵字:	LPCVD反應爐;薄膜成長;熱流設計;LPCVD reactor;Thin film growth;Thermal fluid design
公開日期:	1999
官方說明文件#:	NSC88-2218-E009-001
URI:	http://hdl.handle.net/11536/94464 https://www.grb.gov.tw/search/planDetail?id=431210&docId=77294
Appears in Collections:	Research Plans

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