遠距電漿輔助及垂直型二硫式氮化鎵磊晶表面反應之分析與研究

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氮化鎵 , 垂直型二流式磊晶系統 , 遠距電漿輔助磊晶 , GaN , Vertical-type two-flow reactor , Plasma-enhanced deposition

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https://www.grb.gov.tw/search/planDetail?id=369933&docId=66430
https://ir.lib.nycu.edu.tw/handle/11536/94882

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