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利用同步輻射光源對三五族氮化物半導體薄膜之特性研究
利用同步輻射光源對三五族氮化物半導體薄膜之特性研究
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882112M009031.pdf
(722.81 KB)
Date
1999
Authors
陳文雄
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Keywords
三五族氮化合物
,
同步輻射光源
,
X射線吸收的精細結構光譜
,
X射線駐波
,
III-V nitride
,
Synchrotron radiation
,
X-ray absorption fine structure (XAFS)
,
X-ray standing wave (XSW)
Citation
URI
https://www.grb.gov.tw/search/planDetail?id=426407&docId=76151
https://ir.lib.nycu.edu.tw/handle/11536/94381
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