An intelligent supervisory system for ion implantation in IC fabrication processes

Abstract

This pager presents a real-time intelligent supervision system for IC ion implantation processes. A hardware interface is developed, to extract the features directly from the 2-D analog image signals of a beam map. A qualitative model for the beam scanning is then obtained, and the symptoms of abnormal operations can be analyzed to achieve on-line diagnosis. Furthermore, a fuzzy expert system is developed to advise operators on making appropriate adjustments for the beam scanning. This supervisory system has been implemented on Eaten NV-6200 A/AV ion implanters at the Taiwan Semiconductor Manufacturing Company. (C) 1999 Elsevier Science Ltd. All rights reserved.