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研究計畫;;Research Plans
利用電荷幫浦分佈法研究深次微米N型MOS元件電漿製程傷害之可靠性
利用電荷幫浦分佈法研究深次微米N型MOS元件電漿製程傷害之可靠性
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892215E009107.pdf
(265.06 KB)
Date
2000
Authors
莊紹勳
Chung Steve S
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https://www.grb.gov.tw/search/planDetail?id=583902&docId=109710
https://ir.lib.nycu.edu.tw/handle/11536/93759
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