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光資訊關鍵性材料製程與性質研究---子計畫V:用晶圓接合與溼式蝕刻方式來剝離側向覆蓋生長之氮化鎵磊晶層(I)
光資訊關鍵性材料製程與性質研究---子計畫V:用晶圓接合與溼式蝕刻方式來剝離側向覆蓋生長之氮化鎵磊晶層(I)
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912216E009026.pdf
(293.25 KB)
Date
2002
Authors
吳耀銓
YEWCHUNG SERMONWU
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https://www.grb.gov.tw/search/planDetail?id=785516&docId=151057
https://ir.lib.nycu.edu.tw/handle/11536/93348
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