Thermally activated diffusion observed by in situ reflection high energy electron diffraction intensity monitoring on interrupted SrTiO3 homoepitaxial growth

Abstract

The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.