Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition

Abstract

Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2-) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic.