<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css"> Skip to main content

Characteristics of the Fluorinated High-k Inter-Poly Dielectrics

Loading...
Thumbnail Image

Journal Title

Journal ISSN

Volume Title

Publisher

DOI

10.1109/LED.2010.2074181

Abstract

In this letter, the reliabilities and insulating characteristics of the fluorinated aluminum oxide (Al(2)O(3)) and hafnium oxide (HfO(2)) inter-poly dielectric (IPD) are studied for the first time. Compared with the IPDs without fluorine incorporation, the results clearly indicate that fluorine incorporation process is effective to improve the insulating characteristics of both the Al(2)O(3) and HfO(2) IPDs, mainly ascribed to the trap density reduction and the smooth interface. Although HfO(2) possesses higher dielectric constant to increase the gate coupling ratio, the results apparently indicate that the fluorine incorporation process is more effective to improve the dielectric characteristics of the Al(2)O(3) IPD than the HfO(2) IPD.

Description

Citation

Endorsement

Review

Supplemented By

Referenced By