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學術出版;;Publications
會議論文;;Conferences Paper
Interfacial Layer Engineering for Ge MOSFET by Metal Element Doping and Characterization of Interface Density
Interfacial Layer Engineering for Ge MOSFET by Metal Element Doping and Characterization of Interface Density
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Date
2018-01-01
Authors
Chien, Chao-Hsin
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https://ir.lib.nycu.edu.tw/handle/11536/151068
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