Electron-electron scattering times in low-diffusivity thick RuO2 and IrO2 films

Abstract

We have systematically measured the electron dephasing scattering times from a three-dimensional weak-localization study of low-diffusivity thick RuO2 and IrO2 films. We find that the inelastic electron scattering rate 1/tau(in) varies essentially Linearly with the temperature and there is essentially no dependence of 1/tau(in) on the electron elastic mean free path. This observation is understood in terms of the current theoretical concept for electron-electron scattering in strongly disordered bulk conductors. [S0163-1829(99)02601-6].