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Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003)

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2003-07-01

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10.1149/1.1576571

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http://dx.doi.org/10.1149/1.1576571
 https://ir.lib.nycu.edu.tw/handle/11536/27766

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期刊論文;;Articles

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