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Room temperature epitaxial growth of (001) CeO2 on (001) LaAlO3 by pulsed laser deposition

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10.1002/crat.201300002

Abstract

The room temperature epitaxial growth of CeO2 on lattice matched (001) LaAlO3 substrates by using pulsed laser deposition (PLD) method under various oxygen partial pressure (Po-2) is demonstrated. X-ray diffraction analysis with 2-Theta/rocking curve/Phi-scan, cross-sectional transmission electron microscopy with selected-area diffractions are used to characterize structural of grown films. The epitaxial (001) CeO2 can be achieved at room temperature under Po-2 less than 2 x 10(-3) Torr. The best quality of grown film is obtained under Po-2 = 2 x 10(-5) Torr and degraded under Po-2 = 2 x 10(-6) Torr due to oxygen deficiency in structure. The epitaxial relationship between CeO2 and LAO is confirmed to be (001)CeO2 //(001)LAO, [100](CeO2)//[110](LAO) and [010](CeO2)//[(1)over-bar10](LAO). No obvious reduction reaction occurred, from Ce+4 turned into Ce+3 states, as reducing oxygen partial pressure during growth by PLD.

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