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THE DIELECTRIC RELIABILITY OF INTRINSIC THIN SIO2-FILMS THERMALLY GROWN ON A HEAVILY DOPED SI SUBSTRATE - CHARACTERIZATION AND MODELING

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A1987H858400017.pdf (1.3 MB)

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1987-07-01

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https://ir.lib.nycu.edu.tw/handle/11536/4627

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期刊論文;;Articles

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