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超高真空化學氣相沉積低溫新穎複晶矽薄膜電晶體之製作與可靠度分析---子計畫二：退火製程對超高真空化學氣相沈積法成長之複晶矽薄膜結構的影響與退火複晶矽薄膜電晶體的製作(III)

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892218E009082.pdf (510.54 KB)

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2000

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https://www.grb.gov.tw/search/planDetail?id=597398&docId=112577
 https://ir.lib.nycu.edu.tw/handle/11536/93739

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研究計畫;;Research Plans

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