Title: Multi-gate non-volatile memories with nanowires as charge storage material
Authors: Tsui, Bing-Yue
Wang, Pei-Yu
Chen, Ting-Yeh
Cheng, Jung-Chien
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Issue Date: 1-May-2010
Abstract: Multi-gate non-volatile memory (NVM) cell is a promising approach in the next generation. In this work, the performance of NVMs using nanocrystals (NCs) and nanowires (NWs) as charge trapping materials were evaluated by three-dimensional simulation. It is found that the NWs located at different positions have different charge injection speeds. And the NW density will strongly affect the charge injection efficiency. The NW at channel center can result in large memory window and acceptable channel controllability. Although the total charges injected into NWs is lower than that injected into NCs under the same programming condition, using NWs as charge trapping material exhibits larger memory window and better channel controllability. It is suggested that the NW is a better choice than NC to be charge storage material from the perspective of memory performance. (C) 2010 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.microrel.2010.01.040
http://hdl.handle.net/11536/10011
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2010.01.040
Journal: MICROELECTRONICS RELIABILITY
Volume: 50
Issue: 5
Begin Page: 603
End Page: 606
Appears in Collections:Conferences Paper


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