Title: | Sensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereof |
Authors: | Sheu Jeng-Tzong Chen Chen-Chia |
Issue Date: | 9-Jul-2013 |
Abstract: | The invention disclosed a sensing element integrating silicon nanowire gated-diodes with microfluidic channel, a manufacturing method and a detecting system thereof. The sensing element integrating silicon nanowire gated-diodes with a microfluidic channel includes a silicon nanowire gated-diode, a plurality of reference electrodes, a passivation layer and a microfluidic channel. The reference electrodes are formed on the silicon nanowire gated-diodes, and the passivation layer having a surface decorated with chemical materials is used for covering the silicon nanowire gated-diodes, and the microfluidic channel is connected with the passivation layer. When a detecting sample is connected or absorbed on the surface of the passivation layer, the sensing element integrating silicon nanowire gated-diodes with the microfluidic channel can detect an electrical signal change. |
Gov't Doc #: | G01R027/08 |
URI: | http://hdl.handle.net/11536/104463 |
Patent Country: | USA |
Patent Number: | 08482304 |
Appears in Collections: | Patents |
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