Title: | METHOD FOR ADJUSTING A LAYOUT OF AN INTEGRATED CIRCUIT |
Authors: | CHAO Mango C.-T. CHEN Kuo-An CHANG Tsung-Wei |
Issue Date: | 20-Feb-2014 |
Abstract: | A method for adjusting a layout of an integrated circuit includes a first layer, a second layer, a target metal line, and a first non-target metal line. The integrated circuit is configured for a focused ion beam (FIB) detection to the target metal line. The method includes the steps of: disposing the first non-target metal line on the first layer; disposing the target metal line on the second layer; and adjusting one of the target metal line and the first non-target metal line such that the target metal line can be detected by the FIB detection. |
Gov't Doc #: | G06F017/50 |
URI: | http://hdl.handle.net/11536/104950 |
Patent Country: | USA |
Patent Number: | 20140053122 |
Appears in Collections: | Patents |
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