Title: METHOD FOR FABRICATING A RESISTOR FOR A RESISTANCE RANDOM ACCESS MEMORY
Authors: TSENG Tseung-Yuen
Wang Sheng-Yu
Tsai Chen-Han
Issue Date: 14-Jul-2011
Abstract: A method for fabricating a resistor for a resistance random access memory (RRAM) includes: (a) forming a first electrode over a substrate; (b) forming a variable resistance layer of zirconium oxide on the first electrode under a working temperature, which ranges from 175° C. to 225° C.; and (c) forming a second electrode of Ti on the variable resistance layer.
Gov't Doc #: H01L045/00
URI: http://hdl.handle.net/11536/105283
Patent Country: USA
Patent Number: 20110171811
Appears in Collections:Patents


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