Title: | GaN HEMT with Nitrogen-Rich Tungsten Nitride Schottky Gate and Method of Forming the Same |
Authors: | Chang, Edward Yi Lu, Chung-Yu |
Issue Date: | 10-Mar-2011 |
Abstract: | A GaN HEMT with Schottky gate is disclosed. The GaN HEMT sequentially has a GaN layer, an AlGaN layer, and a Schottky gate on a substrate, and a source and a drain on two sides of the Schottky gate. The Schottky gate is made by a material of nitrogen-rich tungsten nitride, which has a nitrogen content of about 0.5 molar ratio. |
Gov't Doc #: | H01L029/20 H01L029/778 H01L021/335 |
URI: | http://hdl.handle.net/11536/105329 |
Patent Country: | USA |
Patent Number: | 20110057196 |
Appears in Collections: | Patents |
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