Title: Double delta-doped enhancement-mode InGaP/AlGaAs/InGaAs pseudomorphic high electron mobility transistor for linearity application
Authors: Chu, Li-Hsin
Hsu, Heng-Tung
Chang, Edward-Yi
Lee, Tser-Lung
Chen, Sze-Hung
Lien, Yi-Chung
Chang, Chun-Yen
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
Keywords: enhancement-mode;InGaP;PHEMT;high linearity;OIP3
Issue Date: 1-Sep-2006
Abstract: A high linearity and high efficiency enhancement-mode InGaP/AlGaAs/InGaAs pseudomorphic high electron mobility transistor (PHEMT) for single supply operation has been developed. The low voltage operation is achieved by the very low knee voltage of the device and the linearity is improved by the optimizing concentrations of the two 3 delta-doped layers. Biased at drain-to-source voltage V-DS = 2V, the fabricated 0.5 x 200 mu m(2) device exhibited a maximum transconductance of 448 mS/mm. The measured minimum noise figure (NFmin) was 0.86 dB with 12.21 dB associated gain at 10 GHz. The device shows a high output third-order intercept point (OIP3)-P-1dB of 13.2 dB and a high power efficiency of 35% when under wideband code-division multiple-access (W-CDMA) modulation signal.
URI: http://dx.doi.org/10.1143/JJAP.45.L932
http://hdl.handle.net/11536/11887
ISSN: 0021-4922
DOI: 10.1143/JJAP.45.L932
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
Volume: 45
Issue: 33-36
Begin Page: L932
End Page: L934
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