Title: Potential of Enhancement Mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs for Using in High-Speed and Low-Power Logic Applications
Authors: Fatah, Faiz Aizad
Lin, Yueh-Chin
Lee, Tsung-Yun
Yang, Kai-Chun
Liu, Ren-Xuan
Chan, Jing-Ray
Hsu, Heng-Tung
Miyamoto, Yasuyuki
Chang, Edward Yi
材料科學與工程學系
照明與能源光電研究所
電子工程學系及電子研究所
Department of Materials Science and Engineering
Institute of Lighting and Energy Photonics
Department of Electronics Engineering and Institute of Electronics
Issue Date: 1-Jan-2015
Abstract: In this study, a 60-nm enhancement-mode (E-mode) In0.65Ga0.35As/InAs/In0.65Ga0.35As high electron mobility transistor (HEMT) was developed, and its potential for use inhigh-speed and low-power logic applications was investigated. When the E-mode device was biased at a drain-source voltage of 0.5 V, it demonstrated a cutoff frequency of 169 GHz, drain-induced barrier lowering of 70 mV/V, minimum subthreshold swing of 67 mV/decade, and ION/IOFF ratio greater than 1.6 x 10(4). The high performance of the E-mode device is attributed to the use of a thin barrier layer along with Pt gate sinking technology. These results confirm that E-mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs have great potential for use inhigh-speed and low-power logic applications. (C) 2015 The Electrochemical Society. All rights reserved.
URI: http://dx.doi.org/10.1149/2.0171512jss
http://hdl.handle.net/11536/129447
ISSN: 2162-8769
DOI: 10.1149/2.0171512jss
Journal: ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
Issue: 12
Begin Page: N157
End Page: N159
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