| Title: | 微波電漿氮化金屬氧化物及化學氣相沉積鑽石 Nitridation of Metal Oxides and Chemical Vapor Deposition of Diamond by Microwave Plasma |
| Authors: | 張立 CHANG LI 國立交通大學材料科學與工程學系（所） |
| Issue Date: | 2016 |
| Gov't Doc #: | MOST104-2221-E009-028-MY3 |
| URI: | http://hdl.handle.net/11536/130975 https://www.grb.gov.tw/search/planDetail?id=11726714&docId=480827 |
| Appears in Collections: | Research Plans |
- 微波電漿氮化金屬氧化物及化學氣相沉積鑽石 /
- 微波電漿氮化金屬氧化物及化學氣相沉積鑽石 / 張立;CHANG LI
- Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition / Chen, Wei-Chun;Wang, Wei-Lin;Tiwari, Rajanish N.;Chang, Li
- 異質基板塗覆金剛烷及鑽石沉積之研究 / 陳怡錞;Chen, Yi-Chun;張立;Chang, Li
- Fabrication and characterization of spherical polycrystalline diamond emitter arrays / Chen, CF;Huang, WH
- 利用微波電漿化學氣相沉積法於金矽液態基材上合成鑽石之研究 / 高志光;Chih-Kuang Kao;張立;Li Chang
Loading...