Title: Failure Analysis of Gate-all-around Nanowire Field Effect Transistor Under TLP Test
Authors: Zhang, Guoyan
Dong, Aihua
Liu, Nie
Tian, Rui
Yang, Xuejiao
Liu, Zhiwei
Lee, Kohui
Lin, Horng-Chih
Liou, Juin J.
Wang Yuxin
交大名義發表
National Chiao Tung University
Keywords: Electrostatic discharge (ESD);TLP;Nanowire FET;Failure analysis
Issue Date: 2014
Abstract: Electrostatic discharge (ESD) characters of Nanowire Field Effect Transistors have been tested and analyzed in detail in this paper. TLP (transmission line pulsing technique) and semiconductor characterization system have been used for experiments. The failure currents and leakage currents of Nanowire Field Effect Transistor are characterized. Also, physical insights and failure model are provided to analyze the failure mechanism.
URI: http://hdl.handle.net/11536/135878
ISBN: 978-1-4799-2334-2
Journal: 2014 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)
Appears in Collections:Conferences Paper