Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering

Title:	Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
Authors:	Borland, John Chaung, Shang-Shuin Tseng, Tseung-Yuen Joshi, Abhijeet Basol, Bulent Lee, Yao-Jen Kuroi, Takashi Goodman, Gary Khapochkina, Nadya Buyuklimanli, Temel 交大名義發表 National Chiao Tung University
Issue Date:	1-Jan-2019
URI:	http://hdl.handle.net/11536/153690
ISBN:	978-4-86348-727-7
Journal:	2019 NINETEENTH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT)
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Appears in Collections:	Conferences Paper