Title: Influence of As/Al and Sb/Al gas flow ratios on growth of AlAs1-xSbx alloys
Authors: Chen, WK
Ou, J
交大名義發表
電子物理學系
National Chiao Tung University
Department of Electrophysics
Keywords: AlAsSb;MOCVD;solid composition
Issue Date: 1-Dec-1995
Abstract: AlAs1-xSbx epilayers were grown on InP (100) substrates using the metalorganic chemical vapor epitaxial growth technique. Experimental results demonstrate that the solid concentration of AlAsSb is more naturally expressed as a function of the input As/Al partial pressure ratio, and not of the V/III ratio or the Sb mole fraction in group V used during the growth. In fact, the AlAs solid concentration and the input partial pressure ratio of As to Al are proportional to each other. According to the phase diagram described above, the controllability of the solid concentration of AlAsSb could be improved.
URI: http://hdl.handle.net/11536/1640
ISSN: 0021-4922
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
Volume: 34
Issue: 12A
Begin Page: L1581
End Page: L1583
Appears in Collections:Articles