THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS

doi:10.1063/1.114261

Title:	THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS
Authors:	LIOU, BW WU, YH LEE, CL LEI, TF 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
Issue Date:	29-May-1995
URI:	http://dx.doi.org/10.1063/1.114261 http://hdl.handle.net/11536/1912
ISSN:	0003-6951
DOI:	10.1063/1.114261
Journal:	APPLIED PHYSICS LETTERS
Volume:	66
Issue:	22
Begin Page:	3013
End Page:	3014
Appears in Collections:	Articles