Fabrication of Ti and Co silicided shallow junctions using novel techniques

Title:	Fabrication of Ti and Co silicided shallow junctions using novel techniques
Authors:	Ma, MP Lin, CT Cheng, HC 奈米中心 Nano Facility Center
Issue Date:	1995
URI:	http://hdl.handle.net/11536/19998
ISBN:	7-5053-3285-6
Journal:	PROCEEDINGS OF THE FOURTH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY
Begin Page:	A662
End Page:	A664
Appears in Collections:	Conferences Paper