Rapid thermal chemical vapor deposition of nitrogen-doped polysilicon for high-performance and high-reliability CMOS technology

Title:	Rapid thermal chemical vapor deposition of nitrogen-doped polysilicon for high-performance and high-reliability CMOS technology
Authors:	Sun, SC Wang, LS Yeh, FL 電機學院 College of Electrical and Computer Engineering
Issue Date:	1995
URI:	http://hdl.handle.net/11536/20006
ISBN:	1-55899-290-1
ISSN:	0272-9172
Journal:	RAPID THERMAL AND INTEGRATED PROCESSING IV
Volume:	387
Begin Page:	329
End Page:	334
Appears in Collections:	Conferences Paper