THERMAL-OXIDATION OF LIGHTLY-DOPED AND HEAVILY-DOPED SILICON IN PURE N2O

Title:	THERMAL-OXIDATION OF LIGHTLY-DOPED AND HEAVILY-DOPED SILICON IN PURE N2O
Authors:	SUN, SC CHANG, HY 奈米中心 Nano Facility Center
Issue Date:	1993
URI:	http://hdl.handle.net/11536/20220
ISBN:	2-86332-135-8
Journal:	ESSDERC '93 - PROCEEDINGS OF THE 23RD EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE
Begin Page:	403
End Page:	406
Appears in Collections:	Conferences Paper