Title: MAGNESIUM DOPING OF INGAALP GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
Authors: WU, CC
CHANG, CY
CHEN, PA
CHEN, HD
LIN, KC
CHAN, SH
交大名義發表
電控工程研究所
National Chiao Tung University
Institute of Electrical and Control Engineering
Issue Date: 5-Sep-1994
Abstract: Bis(cyclopentadienyl) magnesium, CP2Mg, was used as a magnesium dopant in the InGaAlP layers by low-pressure metalorganic chemical vapor deposition. The hazy surface morphology of heavily doped InGaAlP layers is significantly improved by using magnesium dopant instead of the conventional zinc dopant. We demonstrate that the effective doping efficiency of magnesium is two orders of magnitude higher than that of zinc dopant in the heavily doped InGaAlP layer grown at 720-degrees-C.
URI: http://dx.doi.org/10.1063/1.112091
http://hdl.handle.net/11536/2326
ISSN: 0003-6951
DOI: 10.1063/1.112091
Journal: APPLIED PHYSICS LETTERS
Volume: 65
Issue: 10
Begin Page: 1269
End Page: 1271
Appears in Collections:Articles