Title: | Electrical characteristics of polyoxide prepared by N-2 preannealing |
Authors: | Chang, KM Lee, TC Wang, JY 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
Issue Date: | 1-Jan-2000 |
Abstract: | This paper reports on the electrical characteristics of polyoxide with preoxidation N-2 annealing in a rapid thermal annealing system. By treating the polysilicon film before oxidation, the obtained polyoxide has the desired relative characteristics, i.e., a higher breakdown electric field, a smaller voltage shift, and larger charge-to-breakdown. This improvement is due to the reduction of defects, such as microtwins, inside the grain. (C) 1999 The Electrochemical Society. S1099-0062(99)08-054-2. All rights reserved. |
URI: | http://dx.doi.org/10.1149/1.1390951 http://hdl.handle.net/11536/30879 |
ISSN: | 1099-0062 |
DOI: | 10.1149/1.1390951 |
Journal: | ELECTROCHEMICAL AND SOLID STATE LETTERS |
Volume: | 3 |
Issue: | 1 |
Begin Page: | 39 |
End Page: | 40 |
Appears in Collections: | Articles |