| Title: | EFFECT OF HYDROGEN ON DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEX |
| Authors: | CHIU, HT CHANG, WP 交大名義發表 應用化學系 National Chiao Tung University Department of Applied Chemistry |
| Issue Date: | 1-May-1992 |
| URI: | http://dx.doi.org/10.1007/BF00728611 http://hdl.handle.net/11536/3448 |
| ISSN: | 0261-8028 |
| DOI: | 10.1007/BF00728611 |
| Journal: | JOURNAL OF MATERIALS SCIENCE LETTERS |
| Volume: | 11 |
| Issue: | 9 |
| Begin Page: | 570 |
| End Page: | 572 |
| Appears in Collections: | Articles |
- DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEX / CHIU, HT;CHANG, WP
- ETHYLIMIDOTANTALUM COMPLEX AS PRECURSOR TO TANTALUM NITRIDE THIN-FILMS / CHIU, HT;CHANG, WP
- 以胺基鉭錯化合物經化學氣相沉積碳氮化鉭及氧化鉭薄膜 / 蔡智斌;Chih-Pin Tsai;裘性天;Hsin-Tien Chiu
- 亞胺基鉭錯合物之合成和低壓化學氣相沉積氮化鉭薄膜與薄膜擴散阻抗層的研究 / 蔡重恩;Chung - En Tsai;裘性天;Hsin - Tien Chiu
- Metallo-organic chemical vapor deposition of tantalum carbide and tantalum nitride thin films from (BuCH)-Bu-t=Ta(CH2 Bu-t)(3) and (BuN)-Bu-t=Ta(CH2 Bu-t)(3). / Chiu, HT;Chang, YH;Chang, PJ;Wu, JB;Peng, SM
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