Title: | LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4 |
Authors: | CHIU, HT HUANG, CC 應用化學系 Department of Applied Chemistry |
Issue Date: | 26-Aug-1990 |
URI: | http://hdl.handle.net/11536/4035 |
ISSN: | 0065-7727 |
Journal: | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY |
Volume: | 200 |
Issue: | |
Begin Page: | 253 |
End Page: | INOR |
Appears in Collections: | Articles |