Title: LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4
Authors: CHIU, HT
HUANG, CC
應用化學系
Department of Applied Chemistry
Issue Date: 26-Aug-1990
URI: http://hdl.handle.net/11536/4035
ISSN: 0065-7727
Journal: ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Volume: 200
Issue: 
Begin Page: 253
End Page: INOR
Appears in Collections:Articles