錐狀陣列式微奈米結構之製程研究

Abstract

本論文是研究錐形柱狀漸進式改變微奈米結構陣列之製造方法及其成像原理。利用錐形柱狀漸進式改變微奈米結構陣列所製作光學膜片，會對光源產生擴散與集光之雙重效果，故可達到有效提升光效率之目的，可廣泛運用於液晶顯示器。製作錐形柱狀漸進式改變微奈米結構陣列其實驗步驟如下，首先將矽晶片去水烘烤接著塗底上光阻，完成光阻塗佈後，將矽晶片置於熱墊板上做軟烤，緊接著進步進機進行曝光，曝完光後將矽晶片置於熱墊板上做曝後烤接著顯影及硬烤後完成錐形柱狀漸進式改變微奈米結構的製造。本研究首先提出應用曝光法，透過調整聚焦的變化及改變曝光劑量，即可任意的調整製作不同樣式的錐形柱狀微奈米結構，利用此特性來完成錐形柱狀漸進式改變微奈米結構陣列之製造。

This paper is aimed to study the incremental changes of cone-shaped columnar arrays of submicro structures including manufacturing methods and imaging principles. The optical films, manufactured by using incremental changes of cone-shaped columnar arrays of submicro structures, will produce a double effects to light sources: diffusion and focus, and can be widely used in liquid crystal displays since they can effectively enhance optical efficiency. The experimental steps to manufacture incremental changes of cone-shaped columnar arrays of submicro structures are as follows: first, a silicon wafer, after prebaking to remove water, is coated with photoresist ; then, it will be soft-baked on a heat pad, and followed by progressive photoresist exposures in the step machine; then it will be hard-baked on a heat pad, and followed by photoresist development to complete manufacturing incremental changes of cone-shaped columnar arrays of submicro structures. This study first proposes the exposure method to manufacture incremental changes of cone-shaped columnar arrays of submicro structures. By adjusting the focus changes and changes in exposure dose, you can make any adjustments to the different styles of cone-shaped columnar arrays of submicro structures. So the cone-shaped columnar arrays of submicro structures can be completed by taking advantage of this feature.