THE EFFECTS OF THERMAL NITRIDATION CONDITIONS ON THE RELIABILITY OF THIN NITRIDED OXIDE-FILMS

Title:	THE EFFECTS OF THERMAL NITRIDATION CONDITIONS ON THE RELIABILITY OF THIN NITRIDED OXIDE-FILMS
Authors:	TSAI, HH WU, LC WU, CY HU, CM 工學院 College of Engineering
Issue Date:	1-Apr-1987
URI:	http://hdl.handle.net/11536/4649
ISSN:	0741-3106
Journal:	IEEE ELECTRON DEVICE LETTERS
Volume:	8
Issue:	4
Begin Page:	143
End Page:	145
Appears in Collections:	Articles

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