OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS

Title:	OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS
Authors:	WU, CY KING, CW LEE, MK CHEN, CT SHIH, CT 電控工程研究所 Institute of Electrical and Control Engineering
Issue Date:	1983
URI:	http://hdl.handle.net/11536/4944
ISSN:	0013-4651
Journal:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	130
Issue:	2
Begin Page:	458
End Page:	462
Appears in Collections:	Articles

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APA	WU, C., KING, C., LEE, M., CHEN, C., & SHIH, C. (1983). OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS. WOS:A1983QB20100041.
Bibtex	@article{WU1983OXIDATION, title={OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS}, author={WU, CY and KING, CW and LEE, MK and CHEN, CT and SHIH, CT}, journal={WOS:A1983QB20100041}, year={1983}, url={https://ir.lib.nycu.edu.tw/handle/11536/4944}, }