以低溫超高真空化學汽相沈積法所製元件特性

Title:	以低溫超高真空化學汽相沈積法所製元件特性 Characterization of devices fabricated by low temperature UHV/CVD
Authors:	韓良愷 HAN, LIANG-KAI 張俊彥 ZHANG, JUN-YAN 電子研究所
Keywords:	低溫超高真空化學;相沈積法;元件特性
Issue Date:	1991
URI:	http://140.113.39.130/cdrfb3/record/nctu/#NT802430065 http://hdl.handle.net/11536/56100
Appears in Collections:	Thesis