電漿輔助化學沈積法的氮化矽膜之表面型態對陽極氧化鋁/氮化矽雙層介電層非晶矽薄膜電晶體電性之影響

Title:	電漿輔助化學沈積法的氮化矽膜之表面型態對陽極氧化鋁/氮化矽雙層介電層非晶矽薄膜電晶體電性之影響 Effects of SiNx morphology on the electrical properties of a-Si:H TFT with Al2O3/XiNx double layered gate insulators
Authors:	李秋德 Li, Qiu De 馮明憲 Feng, Ming Xian 材料科學與工程學系
Issue Date:	1994
URI:	http://140.113.39.130/cdrfb3/record/nctu/#NT832159013 http://hdl.handle.net/11536/59677
Appears in Collections:	Thesis