微波電漿化學氣相沉積法研製氧化鈦薄膜

Title:	微波電漿化學氣相沉積法研製氧化鈦薄膜 Fabrication of TiO2 thin films by microwave plasma chemical vapor deposition
Authors:	江炳耀 Jiang, Bing Yao 林鵬 Lin, Peng 材料科學與工程學系
Issue Date:	1994
URI:	http://140.113.39.130/cdrfb3/record/nctu/#NT832159014 http://hdl.handle.net/11536/59678
Appears in Collections:	Thesis

APA	江., Jiang, B. Yao, 林., & Lin, P. (1994). 微波電漿化學氣相沉積法研製氧化鈦薄膜. http://hdl.handle.net/11536/59678.
Bibtex	@article{江炳耀 and Jiang1994, title={微波電漿化學氣相沉積法研製氧化鈦薄膜}, author={江炳耀 and Jiang, Bing Yao and 林鵬 and Lin, Peng}, journal={http://hdl.handle.net/11536/59678}, year={1994}, url={https://ir.lib.nycu.edu.tw/handle/11536/59678}, }