直流磁控電漿濺鍍腔體中多重尺度及物理現象之模擬及實驗研究(II)

Title:	直流磁控電漿濺鍍腔體中多重尺度及物理現象之模擬及實驗研究(II) Multiscale and Multiphysics Modeling and Experiment of a DC-Magnetron Sputtering Chamber(II)
Authors:	吳宗信 WU JONG-SHINN 交通大學機械工程系
Issue Date:	2005
Gov't Doc #:	NSC94-2212-E009-012
URI:	http://hdl.handle.net/11536/90490 https://www.grb.gov.tw/search/planDetail?id=1129110&docId=215076
Appears in Collections:	Research Plans