奈米MOS元件之矽化物、超淺接面及接觸孔之研發(III)

Title:	奈米MOS元件之矽化物、超淺接面及接觸孔之研發(III) Development of Silicide, Ultra-Shallow Junction and Contact Hole in Nano MOS Devices(III)
Authors:	雷添福 LEI TAN-FU 交通大學電子工程研究所
Issue Date:	2004
Gov't Doc #:	NSC93-2215-E009-003
URI:	http://hdl.handle.net/11536/90911 https://www.grb.gov.tw/search/planDetail?id=1026607&docId=195154
Appears in Collections:	Research Plans

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.