| Title: | 新型低溫多晶矽薄膜電晶體結構設計及其製作方法與可靠性研究(I) Fabrication and Reliability of Novel Low Temperature Poly-Silicon Thin Film Transistors Structure Design (I) |
| Authors: | 張國明 CHANG KOW-MING 國立交通大學電子工程研究所 |
| Issue Date: | 2003 |
| Gov't Doc #: | NSC92-2215-E009-065 |
| URI: | http://hdl.handle.net/11536/92149 https://www.grb.gov.tw/search/planDetail?id=873556&docId=167361 |
| Appears in Collections: | Research Plans |
- 超高真空化學氣相沈積低溫新穎複晶矽薄膜電晶體之製作與可靠度的研究---總計畫(I) / 張俊彥;CHANG CHUN-YEN
- Performance and reliability of low-temperature polysilicon TFT with a novel stack gate dielectric and stack optimization using PECVD nitrous oxide plasma / Chang, KM;Yang, WC;Tsai, CP
- 高性能金屬閘極低溫多晶矽薄膜電晶體之研究 / 沈香谷;Shen Hsiang Ku;荊鳳德;Albert Chin
- 低溫多晶矽薄膜電晶體在動態操作下之可靠度研究 / 李逸哲;劉柏村;Po-Tsun Liu
- 以準分子雷射結晶與非晶矽間隙壁結構製作高遷移率複晶矽薄膜電晶體之研究 / 呂健豪;Jian-Hao Lu;鄭晃忠;Huang-Chung Cheng
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