| Title: | 複晶矽表面平坦化之新穎製程技術與應用 A Novel Process Technology for Poly-Si Surface Planarization and Its Application |
| Authors: | 崔秉鉞 Bing-YueTsui 國立交通大學電子工程學系 |
| Issue Date: | 2003 |
| Gov't Doc #: | NSC92-2622-E009-006-CC3 |
| URI: | http://hdl.handle.net/11536/92199 https://www.grb.gov.tw/search/planDetail?id=825779&docId=156317 |
| Appears in Collections: | Research Plans |
- A novel planarization of oxide-filled shallow-trench isolation / Cheng, JY;Lei, TF;Chao, TS;Yen, DLW;Lin, CJ
- 複晶矽薄膜電晶體關鍵技術之研究 / 劉仲;Liu, Chung;葉清發;Ching-Fa Yeh
- 低溫複晶矽薄膜電晶體其結晶方式與新穎結構之研究 / 張哲綸;Che-Lun Chang;雷添福;Tan-Fu Lei
- Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film / Pan, TM;Lei, TF;Ko, FH;Chao, TS;Chiu, TH
- 高介電常數氧化鐠閘極介電層與新穎結構於複晶矽薄膜電晶體之研究 / 張家文;Chia-Wen Chang;雷添福;Tan-Fu Lei
- Fabrication of High-Performance Poly-Si Thin-Film Transistors With Sub-Lithographic Channel Dimensions / Lee, Ko-Hui;Lin, Horng-Chih;Huang, Tiao-Yuan
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